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ASML and Zeiss say 'Hyper NA' successor to High NA EUV could be ready in about 10 years
Engineers from ASML and optics partner Carl Zeiss said in a peer-reviewed paper that a successor to ASML's most advanced machine, dubbed Hyper NA, could be ready in about 10 years and could print features as small as 5 nanometers, reusing much of the existing technology including the current light source. ASML has begun developing the tool but has not committed to producing it, Reuters reported.
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FILE PHOTO: FILE PHOTO: A logo on ASML offices in Veldhoven, Netherlands, March 24, 2026. REUTERS/Nicolas Economou/File Photo/File Photo AMSTERDAM, Oct 8 (Reuters) - A successor to ASML's most advanced chipmakingmachine could be ready in about 10 years, engineers for the company and its optics partner Carl Zeiss said in a peer-reviewed paper. The tool, dubbed "Hyper NA", would print smaller circuitry while re-using much of the companies' existing technology, the paper said, though challenges remain. The machine, which ASML has begun developing but has not committed to producing, matters fo…