| Cleaning systems (CELLESTA single-wafer and batch cleaning) · Wafer cleaning Single-wafer and batch cleaning that removes residual photoresist, particles and impurities after etch. | 前三 No. 3 in cleaning (single-wafer and batch) by Tokyo Electron's estimate, its lowest rank among the nine segments it charts; cleaning was 9% of fiscal 2026 new-equipment sales against 13% the year before. | 中等 The report counts cleaning among its four key processes, but its listed frontend competitive advantages single out etch, film deposition and the EUV coater/developer, not cleaning; ranking third, Tokyo Electron faces at least two larger incumbents in the segment. |
| Coater/developers (CLEAN TRACK LITHIUS Pro series) · Lithography track (photoresist coat/develop) Coats the wafer with photoresist and develops the exposed pattern; the report pairs the coater/developer with EUV lithography exposure. | 領先 Ranked No. 1 in coater/developers and holding a "100% share" of coater/developers for EUV lithography, both by Tokyo Electron's estimate; coater/developers were 28% of fiscal 2026 new-equipment sales of ¥1,775.4 billion. | 深 The report lists "Supporting EUV through coater/developer and optimization technologies" among its frontend competitive advantages, and by Tokyo Electron's own estimate it holds a "100% share" of coater/developers for EUV lithography. |
| Deposition systems (thermal processing, batch ALD/CVD, single-wafer metal deposition) · Film deposition Diffusion furnaces and thermal processing, batch atomic layer and chemical vapor deposition, and single-wafer metal deposition. | 領先 No. 1 in diffusion furnaces (including thermal processing), batch deposition (including ALD and CVD) and metal deposition (single-wafer deposition) by Tokyo Electron's estimate; deposition was 20% of fiscal 2026 new-equipment sales. | 深 The same frontend competitive advantage — a development system for the etch and film deposition that are "the keys to higher performance and scaling" — covers the line, and the report describes DRAM work on "highly difficult capacitor film deposition" and next-generation transition metal materials for NAND word lines. |
| Etch systems (Tactras and Episode UL plasma etch, Certas LEAGA gas chemical etch) · Plasma and gas chemical etch Plasma etch systems and plasma-less gas chemical etch systems that etch dielectric, silicon and other films along the lithography pattern. | 前三 No. 2 in plasma etch and No. 1 in gas chemical etch by Tokyo Electron's estimate; etch was its largest product line at 36% of fiscal 2026 new-equipment sales. | 深 The report lists a "powerful development system for achieving the etch and film deposition that are the keys to higher performance and scaling" as a frontend competitive advantage, and describes development of high aspect ratio etch for DRAM and cryogenic etch for deep holes and trenches in NAND. |
| Field Solutions (parts, services, used equipment and modifications) · Installed-base services Maintenance parts and services, used equipment, and modifications for equipment already installed at customer fabs. | 未知 The report gives no market share for services; it reports Field Solutions sales of ¥626.0 billion in fiscal 2026 (¥435.9 billion parts and services, ¥190.0 billion used equipment and modification), up from ¥538.3 billion the year before. | 中等 Field Solutions sells into Tokyo Electron's own installed base — approximately 100,000 units, industry-leading by its estimate and growing by approximately 4,000-6,000 units a year — and the MD&A attributes fiscal 2026 growth to higher customer utilization lifting modifications, maintenance parts and related services for equipment it had previously sold; the report does not say rivals are excluded from servicing that base. |
| Wafer bonding and laser systems (Synapse, Ulucus) · Advanced packaging and bonding Permanent wafer bonding (Synapse Si), wafer bonding/debonding (Synapse V, Synapse Z Plus), and laser edge trimming and extreme laser lift-off (Ulucus L, Ulucus LX), aimed at HBM, stacked flash and stacked logic. | 前三 No. 2 in bonders by Tokyo Electron's estimate; it estimates the bonding process equipment market will grow at a CAGR of over 30% between 2026 and 2030 and exceed 300 billion yen in 2030. | 中等 The report describes its bonders as fusing process technologies such as plasma control and cleaning with mechanical alignment, leveraging frontend know-how; but its newest systems (Synapse Si, Ulucus L and LX) are still in customer evaluation, which it says is "proceeding smoothly". |
| Wafer probers (Prexa, WDF 12DP+) · Wafer test handling Wafer and dicing-frame probers for electrical testing, including the Prexa SDP singulated device prober for known-good-die testing in advanced packaging. | 領先 No. 1 in wafer probers by Tokyo Electron's estimate; wafer probers were 5% of fiscal 2026 new-equipment sales. | 中等 The report's backend competitive advantages cite a "yield improvement approach through fusion of bonding and testing technologies", and it launched the Prexa SDP for the heat-absorption and temperature-control challenges of testing leading-edge devices; it offers no other barrier evidence for the line. |